Panoramic Technology Support

Panoramic Technology Research

Technical background on Panoramic Technology Simulation Software

• Pistor, T. V., "Electromagnetic Simulation and Modeling with Applications in Lithography", Ph.D. Thesis, Memorandum No. UCB/ERL M01/19, May 1, 2001.

Research papers authored by Panoramic Technology

• Pistor, T. V., "Simulation of Immersion Lithography at the 45nm Node", (unpublished), Panoramic Technology Research, 2004.

• Pistor, T. V., Berger, K., "Bias Optimization Through Simulation For Contact Array Pattern", SPIE Vol. 5256, Proceedings Photomask Technology, 2003.

• Pistor, T. V., "Simulating Various Aspects of Immersion Lithography", (draft, unpublished) Panoramic Technology Research July, 2003.

• Pistor, T. V., "Simulation of Alternating Phase Shift Masks with EM-Suite", (unpublished) Panoramic Technology Research, March, 2003.

• Pistor, T. V., "A New Photoresist Simulator from Panoramic Technology", (unpublished) Panoramic Technology Research, October, 2002.

• Pistor, T. V., Socha, R. J., "Rigorous Electromagnetic Simulation of Stepper Alignment", SPIE Vol. 4689, Proceedings Microlithography, 2002.

• Pistor, T. V., "Rigorous 3D Simulation of Phase Defects in Alternating Phase-Shifting Masks", SPIE Vol. 4562, 2001.

• Pistor, T. V., "Accuracy Issues in the Finite Difference Time Domain Simulation of Photomask Scattering", SPIE Vol. 4346, 2001.

• Pistor, T. V., Neureuther, A. R., Socha, R. J., "Modeling Oblique Incidence Effects in Photomasks", SPIE Proceedings, Microlithography 2000.

Selected published papers enabled by Panoramic Technology Software

• Hoyoung Kang et al., “EUV simulation extension study for mask shadowing effect and its correction”, Proc. SPIE Vol. 6921-130, 2008.

• Kostas Adam, Michael Lam, “Hybrid Hopkins-Abbe method for modeling oblique angle mask effects in OPC”, Proc. SPIE Vol. 6924-49, 2008.

• Norihiro Yamamoto, Jongwook Kye, Harry J. Levinson, "Mask Topography Effect with Polarization at Hyper NA", Proc. SPIE Vol. 6154-171, 2006.

• Yosuke Kojima, Takashi Ohshima, Kazuaki Chiba, Toshio Konishi, "Performance Study of Chromeless Phase Lithography Mask for the 65nm Node and Beyond", Proc. SPIE Vol. 6154-81, 2006.

• Takahiro Matsumoto, Hideki Ina, Koichi Sentoku, "Alignment Offset Analyser agains Wafer Induced Shift (WIS)", Proc. SPIE Vol. 5375, 2004.

• Shoji Hotta, Katsuya Hayao, Kazuyuki Kakuta, Norio Hasegawa, "New Double Exposure Technique using Alternating Phase-Shifting Mask with Reversed Phase", Proc. SPIE Vol. 5377, 2004

• Joel L. Seligson, Boris Golovanevsky, Jorge M. Poplawski, Michael E. Adel, Richard M. Silver, "Overlay metrology simulations: analytical and experimental validations", Proc. SPIE Vol. 5038, p. 61-69, Metrology, Inspection, and Process Control for Microlithography XVII; Daniel J. Herr; Ed., May 2003

• Toshio Konishi et al., "Study of alternating phase shift mask structure for 65nm node devices", Proceedings of SPIE Vol. 5256, 2003.

• Armen Kroyan, Hua-Yu Liu, "Effects of Alternating Aperture PSM Design on Image Imbalance for 65nm Technology", Proc. SPIE Vol. 4889, p. 1217-1226, 22nd Annual BACUS Symposium on Photomask Technology; Brian J. Grenon, Kurt R. Kimmel; Eds., Dec 2002

• Amr Y. Abdo, Pei-yang Yan, "Numerical investigation of EUV mask contact layer defect printability at the 30-nm technology node", Proc. SPIE Vol. 4688, p. 725-732, Emerging Lithographic Technologies VI; Roxann L. Engelstad; Ed., Jul 2002

• Paul Harris, Martin McCallum, "Effect of Aberrations on Defect Printing and Inspection", Proceedings of SPIE Vol. 4691, Part two, Page1480, 2002.

• Kei Mesuda, Nobuhito Toyama, Shogo Narukawa, Yutaka Morikawa, Hiroshi Mohri, Naoya Hayashi and Morihisa Hoga, "Optimization of Alt-PSM stucture for 100nm-node ArF Lithography", Proceedings of SPIE Vol.4754, p.396, 2002.

• Ken Ozawa, et al., "Defect Printability of Alternating Phase-Shift Mask: A critical Comparison of Simulation and Experiment", 2002 SPIE (Optical lithography vol.4621,p1009-1020)

• Ken Ozawa et al., "Defect Printability of ArF Alternating Phase-Shift Mask: A critical Comparison of Simulation and Experiment", 2002 PMJ (SPIE vol. 4754, p630-639)

• Stephen Hsu et al., "Reticle Defect Printability for Sub-0.3k1 Chromeless Phase Lithography (CPL) Technology", Proceedings SPIE Vol. 4754, 2002.

• Erdmann, A., Gordon R., McCallum, M., Rosenbusch, A., "3D electromagnetic field simulation for low-k1 lithography", Microlithography World magazine, Volume 10, Number 1, February 2001.

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